Nanofabrication by scanning probe microscope lithography: A review

نویسندگان

  • Ampere A. Tseng
  • Andrea Notargiacomo
  • T. P. Chen
چکیده

In addition to its well-known capabilities in imaging and spectroscopy, scanning probe microscopy sSPMd has recently shown great potentials for patterning of material structures in nanoscales. It has drawn the attention of not only the scientific community, but also the industry. This article examines various applications of SPM in modification, deposition, removal, and manipulation of materials for nanoscale fabrication. The SPM-based nanofabrication involves two basic technologies: scanning tunneling microscopy and atomic force microscopy. Major techniques related to these two technologies are evaluated with emphasis on their abilities, efficiencies, and reliabilities to make nanostructures. The principle and specific approach underlying each technique are presented; the differences and uniqueness among these techniques are subsequently discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technology improvement and future research are recommended. © 2005 American Vacuum Society. fDOI: 10.1116/1.1926293g

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تاریخ انتشار 2005